TY - GEN
T1 - A discrete dislocation approach to grain boundary diffusion
AU - Ayas, Can
AU - Van Der Giessen, Erik
N1 - Funding Information:
Financial support by the European Commission NANOMESO project no. knowledged.
Funding Information:
Financial support by the European Commission NANOMESO project no. 16710 is gratefully acknowledged.
Publisher Copyright:
© MMM 2008. All rights reserved.
PY - 2008
Y1 - 2008
N2 - Stresses, and their relaxation, in thin films at size scales on the order of (sub)micrometers are critical to the mechanical reliability of small devices. In this study we present a discrete dislocation dynamics framework to describe diffusional stress relaxation. We find a nearly linear relationship between the relaxed, residual tensile stress and grain size. The origin lies in the amount of diffused material and the opening profile along the grain boundary.
AB - Stresses, and their relaxation, in thin films at size scales on the order of (sub)micrometers are critical to the mechanical reliability of small devices. In this study we present a discrete dislocation dynamics framework to describe diffusional stress relaxation. We find a nearly linear relationship between the relaxed, residual tensile stress and grain size. The origin lies in the amount of diffused material and the opening profile along the grain boundary.
UR - http://www.scopus.com/inward/record.url?scp=85067122317&partnerID=8YFLogxK
M3 - Conference contribution
AN - SCOPUS:85067122317
T3 - Proceedings of 4th International Conference on Multiscale Materials Modeling, MMM 2008
SP - 768
EP - 771
BT - Proceedings of 4th International Conference on Multiscale Materials Modeling, MMM 2008
A2 - El-Azab, Anter
PB - Department of Scientific Computing, Florida State University
T2 - 4th International Conference on Multiscale Materials Modeling, MMM 2008
Y2 - 27 October 2008 through 31 October 2008
ER -