A Modeling Framework and Flux Controller for Free Molecular Flow Deposition Processes

Martijn Dresscher, Bayu Jayawardhana, Jose de Jesus Barradas Berglind, Jacquelien M.A. Scherpen

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

2 Citations (Scopus)
267 Downloads (Pure)

Abstract

In this paper, we introduce a modeling framework for free molecular flow (FMF) processes (such as, deposition processes under an ultra-high vacuum condition) that is suitable for model-based control design. The generic dynamical model is comprised of four important elements in such processes: (i) particle transfer, which is modeled based on the well- known Knudsen cosine law; (ii) particle leakage; (iii) adsorption and desorption described by a (nonlinear) sticking function; and (iv) control input particle flux. As a starting point for obtaining accurate control on the deposition process in FMF regime, we propose a control design method for stabilization with guaranteed transient behavior for fluxes. It is based on a point-wise min-norm control approach, employing both control Lyapunov and control barrier functions. Lastly, we validate our model, applied to a cylindrical geometry, with existing results in literature and evaluate the effectiveness of the proposed control method for controlling the fluxes.
Original languageEnglish
Title of host publicationProceedings of the American Control Conference
PublisherIEEE
Pages2164-2170
Number of pages7
ISBN (Print)978-1-5090-5992-8
DOIs
Publication statusPublished - 2017
Event2017 American Control Conference - Sheraton Seattle Hotel, Seattle, United States
Duration: 24-May-201726-May-2017
http://acc2017.a2c2.org/

Conference

Conference2017 American Control Conference
Abbreviated titleACC 2017
Country/TerritoryUnited States
CitySeattle
Period24/05/201726/05/2017
Internet address

Keywords

  • free molecular flow deposition process
  • modeling
  • process control

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