@article{660d6c41534746c39620d0ddc61812aa,
title = "Dependence of ion charge-energy emission from Nd:YAG-laser-produced plasma on laser intensity in the 0.4 - 40 × 10 10 W/cm2 range",
abstract = "We experimentally characterize the ionic emission, including the individual charge states Snz+ ( z = 1 , … , 8 ), from laser-produced tin plasma as a function of the intensity of the employed ns-pulsed laser. The plasma is generated in a vacuum from tin microdroplets (diameter ranging from 17 to 35 μm) using pulsed Nd:YAG laser light (laser wavelength λ = 1.064 μm) over a range of intensities (0.4- 40 × 10 10 W/cm2). We measure charge-state-resolved and integrated ion energy distributions at seven angular positions around the plasma using seven retarding field analyzers. We highlight peak features in both types of spectra and describe the dependence of their energies on laser intensity with power-law functions. The resulting power laws match those derived from plasma radiation hydrodynamics theory. The analytical scaling laws exhibit strong isotropy, while the ion energy spectra are highly anisotropic.",
author = "Lucas Poirier and Adam Lassise and Ronnie Hoekstra and John Sheil and Oscar Versolato",
note = "Funding Information: The authors thank Duncan Verheijde for his support in understanding and improving the RFA electronics. They also thank Jorijn Kuster for the indispensable software support of our experimental setups. This work has been carried out at the Advanced Research Center for Nanolithography (ARCNL). ARCNL is public–private partnership with founding partners UvA, VU, NWO-I, and ASML, and associate partner RUG. This project has received funding from European Research Council (ERC) Starting Grant No. 802648. This publication is part of the project New Light for Nanolithography (with Project No. 15697) of the research program VIDI, which is (partly) financed by the Dutch Research Council. This work made use of the Dutch National e-Infrastructure with the support of the SURF Cooperative using Grant No. EINF-2947. Funding Information: The authors thank Duncan Verheijde for his support in understanding and improving the RFA electronics. They also thank Jorijn Kuster for the indispensable software support of our experimental setups. This work has been carried out at the Advanced Research Center for Nanolithography (ARCNL). ARCNL is public-private partnership with founding partners UvA, VU, NWO-I, and ASML, and associate partner RUG. This project has received funding from European Research Council (ERC) Starting Grant No. 802648. This publication is part of the project New Light for Nanolithography (with Project No. 15697) of the research program VIDI, which is (partly) financed by the Dutch Research Council. This work made use of the Dutch National e-Infrastructure with the support of the SURF Cooperative using Grant No. EINF-2947. Publisher Copyright: {\textcopyright} 2023 Author(s).",
year = "2023",
month = aug,
day = "1",
doi = "10.1063/5.0150883",
language = "English",
volume = "30",
journal = "Physics of plasmas",
issn = "1070-664X",
publisher = "AMER INST PHYSICS",
number = "8",
}