Direct determination of flat-band voltage for metal/high kappa oxide/semiconductor heterointerfaces by electric-field-induced second-harmonic generation

C. -L. Chang, W. C. Lee, L. K. Chu, M. Hong, J. Kwo*, Y. -M. Chang

*Corresponding author for this work

Research output: Contribution to journalArticleAcademicpeer-review

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Abstract

We have employed electric-field-induced second-harmonic (EFISH) generation to determine the flat-band voltage (V(FB)) of Cr/ALD-Al(2)O(3)/MBE-HfO(2)/n-Si (001) MOS structure. Due to the phase sensitivity of EFISH signal to the electric field in the space charge region, the VFB of -1.20 +/- 0.07 V was determined by analyzing the relative phase change in the EFISH signal as a function of the applied gate voltage. The obtained value is in good agreement with that estimated by the capacitance-voltage measurement. This study demonstrated an all-optical technique to directly determine the flat-band voltage for the high kappa oxide/Si heterointerfaces. (C) 2011 American Institute of Physics.
Original languageEnglish
Article number171902
Pages (from-to)171902-1 - 171902-3
Number of pages3
JournalJournal of Materials Research
Volume98
Issue number17
DOIs
Publication statusPublished - 25-Apr-2011
Externally publishedYes

Keywords

  • MOS
  • SPECTROSCOPY

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