Electro-deposition as a repair method for embedded metal grids

  • A. Jolt Oostra
  • , Anil Reddy
  • , Edsger C. P. Smits
  • , Robert Abbel
  • , Wilhelm A. Groen
  • , Paulw. M. Blom
  • , Jasper J. Michels*
  • *Corresponding author for this work

    Research output: Contribution to journalArticleAcademicpeer-review

    3 Citations (Scopus)
    94 Downloads (Pure)

    Abstract

    A method is presented to self-repair cracks in embedded silver grid structures used in large area organic electronics. The repair procedure is based on electro-deposition, incited by the application of a moderate DC voltage across the crack. During this process the organic anode that is in direct electrical contact with the silver grid, functions as an appropriate medium for ion migration. Restoration of conductivity is achieved by the formation of dendritic metal structures that connect the cathodic to the anodic side of the crack. The metal dendrites decrease the gap resistance by one order of magnitude. Subsequently, another three orders of magnitude are gained upon sintering the dendrites using a high voltage pulse, yielding restored conductance levels nearly within one order of magnitude difference from native track conductance. (C) 2016 Elsevier B.V. All rights reserved.

    Original languageEnglish
    Pages (from-to)202-205
    Number of pages4
    JournalThin Solid Films
    Volume603
    DOIs
    Publication statusPublished - 31-Mar-2016

    Keywords

    • Repair
    • Electromigration
    • Metal grid
    • Organic light emitting diodes
    • Organic photovoltaics
    • Devices
    • SILVER NANOPARTICLE INKS
    • CURRENT COLLECTING GRIDS
    • ORGANIC SOLAR-CELLS

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