Enhancing the Kinetics of Vapor-based Polymerization by Pulsed Filament Approach

Initiated chemical vapor deposition is a versatile technique for synthesizing conformal polymer films on both planar and porous surfaces. It can retain functional groups and avoid undesired cross-linking. However, there is still room for enhancing its performance without altering the feed parameters. Here, we investigate a pulsed iCVD approach to improve the deposition process, achieved by switching on and off the resistively heated filament periodically. By strategically switching off the filament, a shortage of thermally activated primary radicals was created, which allowed uninterrupted chain propagation with fewer termination reactions and potentially increased monomer conversion rates. This has caused significantly faster deposition kinetics with a higher molecular weight and longer chain length for poly(glycidyl methacrylate) compared to continuous deposition. Spectra analyses confirmed that the functionality and stoichiometry ratios remained intact throughout the pulsed deposition process. The pulsed iCVD method is therefore a competitive and sustainable tool, demonstrating fast deposition kinetics and a well-preserved functionality.