Ferrite Films: Deposition Methods and Properties in View of Applications

Pieter J. van der Zaag, O. Fitchorova, A. Sokolov, Vincent G. Harris

Research output: Chapter in Book/Report/Conference proceedingChapterAcademicpeer-review

Abstract

This chapter explores the deposition of ferrite films using a myriad of physical, chemical, and mechanical deposition technologies, including molecular beam epitaxy, pulsed-laser deposition, chemical vapor deposition, sputtering, atomic layer deposition, screen printing, spin-spray, and others. Ferrites are magnetic oxides that exist in spinel, garnet, and hexaferrite structures. The chapter presents a brief discussion of each material phase in terms of their crystal structure, chemistry, and magnetic properties. This discussion is intended to provide the reader a broad overview of the fundamental physical and chemical principles required to better understand the functional properties and utility of ferrites. The chapter also explains challenges such as process compatibility, substrate lattice matching, crystal quality, and process yields in the context of realizing the potential of new technologies that embrace the powerful multifunctionality of magneto dielectric ferrites.
Original languageEnglish
Title of host publicationModern Ferrites
Subtitle of host publicationBasic Principles, Processing and Properties
EditorsVincent G. Harris
PublisherJohn Wiley and Sons Ltd
Chapter10
Pages295-411
Number of pages117
Volume1
ISBN (Electronic)9781118971499
ISBN (Print)9781118971468
DOIs
Publication statusPublished - 28-Oct-2022

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