Formation of hollow atoms at metal- and insulator surfaces

R Morgenstern*, H Khemliche, R Hoekstra

*Corresponding author for this work

    Research output: Contribution to journalArticleAcademicpeer-review

    2 Citations (Scopus)

    Abstract

    The interaction of multiply charged ions with various surfaces gives rise to the formation of so-called hollow atoms via multiple electron capture into excited orbitals. The potential energy of the ions is partly converted into photons and kinetic energy of emitted electrons during subsequent decay of these hollow atoms. Also it might give rise to localized surface structure modifications. We have used Auger electron spectroscopy to investigate the various electronic processes which take place at metal- and LiF insulator surfaces as well as a LiF-covered Au(111) surface. The surface sensitivity of these processes is demonstrated by the fact that after a monolayer coverage, the spectra closely resemble those of a pure LiF target.

    Original languageEnglish
    Pages (from-to)705-710
    Number of pages6
    JournalApplied Physics A: Materials Science & Processing
    Volume67
    Issue number6
    Publication statusPublished - Dec-1998

    Keywords

    • HIGHLY-CHARGED IONS
    • ABOVE-SURFACE
    • FULLERENE FILMS
    • FRONT
    • COLLISIONS
    • NEUTRALIZATION
    • ACCELERATION
    • SCATTERING
    • MODEL

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