Generation of 2-micrometer wavelength laser-light to drive euv-emitting plasmas

Lars Behnke*, Yahia Y. Mostafa, Ruben Schupp, Zoi Bouza, Adam Lassise, Muharrem Bayraktar, John Sheil, Ronnie Hoekstra, Wim Ubachs, Oscar O. Versolato

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review


A laser system based on three-wave mixing is used to generate laser-light at 2-micometer wavelength. This system is used for in-depth studies of the utility of 2-micrometer-driven sources of extreme ultraviolet (EUV) light in Nanolithography.

Original languageEnglish
Title of host publicationMid-Infrared Coherent Sources, MICS 2022
PublisherOptica Publishing Group (formerly OSA)
ISBN (Electronic)9781557528209
Publication statusPublished - 2022
EventMid-Infrared Coherent Sources, MICS 2022 - Budapest, Hungary
Duration: 21-Mar-202225-Mar-2022

Publication series

NameOptics InfoBase Conference Papers


ConferenceMid-Infrared Coherent Sources, MICS 2022


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