Hollow-cathode activated PECVD for the high-rate deposition of permeation barrier films

Michiel Top; Steffen Schoenfeld; John Fahlteich; Sebastian Bunk; Thomas Kuehnel; Steffen Straach; Jeff T. De Hosson

doi:10.1016/j.surfcoat.2016.09.003

Hollow-cathode activated PECVD for the high-rate deposition of permeation barrier films

Michiel Top^*, Steffen Schoenfeld, John Fahlteich, Sebastian Bunk, Thomas Kuehnel, Steffen Straach, Jeff T. De Hosson

^*Corresponding author for this work

Research output: Contribution to journal › Article › Academic › peer-review

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Abstract

This paper shows a study on the variation of the flow ratio between oxygen and Hexamethyldisiloxane (HMDSO) in a hollow cathode arc PECVD process. Dynamic deposition rates were measured between 300 and 500 nm * m/ min. The deposited plasma polymer films were analyzed using visible light spectroscopy, X-ray photo -electron spectroscopy (XPS), X-ray reflectivity (XRR), Fourier -transformed infrared spectroscopy (FTIR), Scanning electron microscopy (SEM) and water vapor transmission rate (WVTR) measurements. The deposited samples were compared to a reactively sputtered SiO2 thin film. By increasing the oxygen to HMDSO flow ratio, the chemical, density and optical properties of the coating approached the sputtered Si02 film. However the permeation barrier of the SiO2 film only shows a slight improvement over that of the bare PET substrate. The organic coating with high power and low oxygen flow, which was deposited with a deposition rate of 450 nm * m/min, approached the barrier of the sputtered SiO2 thin film with a WVTR of 0.16 g/(m' day). 2016 Elsevier B.V. All rights reserved.

Original language	English
Pages (from-to)	155-159
Number of pages	5
Journal	Surface & Coatings Technology
Volume	314
Issue number	Special ussue
DOIs	https://doi.org/10.1016/j.surfcoat.2016.09.003
Publication status	Published - 25-Mar-2017
Event	59th Annual Technical Conference of the Society-of-Vacuum-Coaters (SVC) - Indianapolis, India Duration: 10-May-2016 → 13-May-2016

Keywords

WVTR
PECVD
ArcPECVD
High rate deposition
Hollow cathode
XRay reflectivity
CHEMICAL-VAPOR-DEPOSITION
LOW-TEMPERATURE PECVD
ORGANOSILICON FILMS
THIN-FILMS
SPECTROSCOPY
SPECTROMETRY
PLASMAS
SIO2

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@article{c705878532bf4df9b6d04c995c7c0524,

title = "Hollow-cathode activated PECVD for the high-rate deposition of permeation barrier films",

abstract = "This paper shows a study on the variation of the flow ratio between oxygen and Hexamethyldisiloxane (HMDSO) in a hollow cathode arc PECVD process. Dynamic deposition rates were measured between 300 and 500 nm * m/ min. The deposited plasma polymer films were analyzed using visible light spectroscopy, X-ray photo -electron spectroscopy (XPS), X-ray reflectivity (XRR), Fourier -transformed infrared spectroscopy (FTIR), Scanning electron microscopy (SEM) and water vapor transmission rate (WVTR) measurements. The deposited samples were compared to a reactively sputtered SiO2 thin film. By increasing the oxygen to HMDSO flow ratio, the chemical, density and optical properties of the coating approached the sputtered Si02 film. However the permeation barrier of the SiO2 film only shows a slight improvement over that of the bare PET substrate. The organic coating with high power and low oxygen flow, which was deposited with a deposition rate of 450 nm * m/min, approached the barrier of the sputtered SiO2 thin film with a WVTR of 0.16 g/(m' day). 2016 Elsevier B.V. All rights reserved.",

keywords = "WVTR, PECVD, ArcPECVD, High rate deposition, Hollow cathode, XRay reflectivity, CHEMICAL-VAPOR-DEPOSITION, LOW-TEMPERATURE PECVD, ORGANOSILICON FILMS, THIN-FILMS, SPECTROSCOPY, SPECTROMETRY, PLASMAS, SIO2",

author = "Michiel Top and Steffen Schoenfeld and John Fahlteich and Sebastian Bunk and Thomas Kuehnel and Steffen Straach and {De Hosson}, {Jeff T.}",

note = "Part of special issue: Selected papers from the Society of Vacuum Coaters 59th Annual Technical Conference Edited by Scott G. Walton, Chris H. Stoessel, Ralf Bandorf ; 59th Annual Technical Conference of the Society-of-Vacuum-Coaters (SVC) ; Conference date: 10-05-2016 Through 13-05-2016",

year = "2017",

month = mar,

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doi = "10.1016/j.surfcoat.2016.09.003",

language = "English",

volume = "314",

pages = "155--159",

journal = "Surface & Coatings Technology",

issn = "0257-8972",

publisher = "Elsevier Science",

number = "Special ussue",

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TY - JOUR

T1 - Hollow-cathode activated PECVD for the high-rate deposition of permeation barrier films

AU - Top, Michiel

AU - Schoenfeld, Steffen

AU - Fahlteich, John

AU - Bunk, Sebastian

AU - Kuehnel, Thomas

AU - Straach, Steffen

AU - De Hosson, Jeff T.

N1 - Part of special issue: Selected papers from the Society of Vacuum Coaters 59th Annual Technical Conference Edited by Scott G. Walton, Chris H. Stoessel, Ralf Bandorf

PY - 2017/3/25

Y1 - 2017/3/25

N2 - This paper shows a study on the variation of the flow ratio between oxygen and Hexamethyldisiloxane (HMDSO) in a hollow cathode arc PECVD process. Dynamic deposition rates were measured between 300 and 500 nm * m/ min. The deposited plasma polymer films were analyzed using visible light spectroscopy, X-ray photo -electron spectroscopy (XPS), X-ray reflectivity (XRR), Fourier -transformed infrared spectroscopy (FTIR), Scanning electron microscopy (SEM) and water vapor transmission rate (WVTR) measurements. The deposited samples were compared to a reactively sputtered SiO2 thin film. By increasing the oxygen to HMDSO flow ratio, the chemical, density and optical properties of the coating approached the sputtered Si02 film. However the permeation barrier of the SiO2 film only shows a slight improvement over that of the bare PET substrate. The organic coating with high power and low oxygen flow, which was deposited with a deposition rate of 450 nm * m/min, approached the barrier of the sputtered SiO2 thin film with a WVTR of 0.16 g/(m' day). 2016 Elsevier B.V. All rights reserved.

AB - This paper shows a study on the variation of the flow ratio between oxygen and Hexamethyldisiloxane (HMDSO) in a hollow cathode arc PECVD process. Dynamic deposition rates were measured between 300 and 500 nm * m/ min. The deposited plasma polymer films were analyzed using visible light spectroscopy, X-ray photo -electron spectroscopy (XPS), X-ray reflectivity (XRR), Fourier -transformed infrared spectroscopy (FTIR), Scanning electron microscopy (SEM) and water vapor transmission rate (WVTR) measurements. The deposited samples were compared to a reactively sputtered SiO2 thin film. By increasing the oxygen to HMDSO flow ratio, the chemical, density and optical properties of the coating approached the sputtered Si02 film. However the permeation barrier of the SiO2 film only shows a slight improvement over that of the bare PET substrate. The organic coating with high power and low oxygen flow, which was deposited with a deposition rate of 450 nm * m/min, approached the barrier of the sputtered SiO2 thin film with a WVTR of 0.16 g/(m' day). 2016 Elsevier B.V. All rights reserved.

KW - WVTR

KW - PECVD

KW - ArcPECVD

KW - High rate deposition

KW - Hollow cathode

KW - XRay reflectivity

KW - CHEMICAL-VAPOR-DEPOSITION

KW - LOW-TEMPERATURE PECVD

KW - ORGANOSILICON FILMS

KW - THIN-FILMS

KW - SPECTROSCOPY

KW - SPECTROMETRY

KW - PLASMAS

KW - SIO2

U2 - 10.1016/j.surfcoat.2016.09.003

DO - 10.1016/j.surfcoat.2016.09.003

M3 - Article

SN - 0257-8972

VL - 314

SP - 155

EP - 159

JO - Surface & Coatings Technology

JF - Surface & Coatings Technology

IS - Special ussue

T2 - 59th Annual Technical Conference of the Society-of-Vacuum-Coaters (SVC)

Y2 - 10 May 2016 through 13 May 2016

ER -

Hollow-cathode activated PECVD for the high-rate deposition of permeation barrier films

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Keywords

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