Lattice sites of ion-implanted Li in diamond

  • M. Restle
  • , K. Bharuth-Ram
  • , H. Quintel
  • , C. R. Ronning
  • , H. C. Hofsäss
  • , S. G. Jahn
  • , U. Wahl

Research output: Contribution to journalArticleAcademicpeer-review

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Abstract

Radioactive Li ions were implanted into natural IIa diamonds at temperatures between 100 and 900 K. Emission channeling patterns of α‐particles emitted in the nuclear decay of 8Li(t1/2=838 ms) were measured and, from a comparison with calculated emission channeling and blocking effects from Monte Carlo simulations, the lattice sites taken up by the Li ions were quantitatively determined. A fraction of 40(5)% of the implanted Li ions were found to be located on tetrahedral interstitial lattice sites, and 17(5)% on substitutional sites. The fractions of implanted Li on the two lattice sites showed no change with temperature, indicating that Li diffusion does not take place within the time window of our measurements.
Original languageEnglish
Pages (from-to)2733-2735
Number of pages3
JournalApplied Physics Letters
Volume66
Issue number20
DOIs
Publication statusPublished - 15-May-1995

Keywords

  • CONDUCTION
  • DOPANTS

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