Liquid polystyrene: A room-temperature photocurable soft lithography compatible pour-and-cure-type polystyrene

Tobias M. Nargang, Lara Brockmann, Pavel Mitkov Nikolov, Dieter Schild, Dorothea Helmer, Nico Keller, Kai Sachsenheimer, Elisabeth Wilhelm, Leonardo Pires, Marian Dirschka, Alexander Kolew, Marc Schneider, Matthias Worgull, Stefan Giselbrecht, Christiane Neumann, B. E. Rapp*

*Corresponding author for this work

Research output: Contribution to journalArticleAcademicpeer-review

23 Citations (Scopus)
9 Downloads (Pure)
Original languageEnglish
Pages (from-to)2698-2708
JournalLab on a Chip
Volume14
DOIs
Publication statusPublished - 2014
Externally publishedYes

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