Microstructure and chemical bonding of DLC films deposited on ACM rubber by PACVD

D. Martinez-Martinez; M. Schenkel; Y.T. Pei; J.C. Sánchez-López; J.Th.M. De Hosson

doi:10.1016/j.surfcoat.2011.02.067

Microstructure and chemical bonding of DLC films deposited on ACM rubber by PACVD

D. Martinez-Martinez^*, M. Schenkel, Y.T. Pei, J.C. Sánchez-López, J.Th.M. De Hosson

^*Corresponding author for this work

Zernike Institute for Advanced Materials

Research output: Contribution to journal › Article › Academic › peer-review

27 Citations (Scopus)

Abstract

The microstructure and chemical bonding of DLC films prepared by plasma assisted chemical vapor deposition on acrylic rubber (ACM) are studied in this paper. The temperature variation produced by the ion impingement during plasma cleaning and subsequent film deposition was used to modify the film microstructure by controlling the different degrees of strain applied to the substrate. The film microstructure is studied by top view and cross sectional SEM. The observed patch sizes are correlated with the variation of temperature that occurred during deposition. Finally, the chemical bonding of the samples is studied by Raman spectroscopy. All the samples show similar spectra regardless the bias voltage used. (C) 2011 Elsevier B.V. All rights reserved.

Original language	English
Pages (from-to)	S75-S78
Number of pages	4
Journal	Surface & Coatings Technology
Volume	205
DOIs	https://doi.org/10.1016/j.surfcoat.2011.02.067
Publication status	Published - 25-Jul-2011
Event	12th International Conference on Plasma Surface Engineering - , Germany Duration: 13-Sept-2010 → 17-Sept-2010

Keywords

Scanning electron microscopy (SEM)
Plasma-assisted chemical vapor deposition (PACVD)
Rubber
Raman spectroscopy
FILTERED-ARC-DEPOSITION
AMORPHOUS-CARBON
COATINGS

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title = "Microstructure and chemical bonding of DLC films deposited on ACM rubber by PACVD",

abstract = "The microstructure and chemical bonding of DLC films prepared by plasma assisted chemical vapor deposition on acrylic rubber (ACM) are studied in this paper. The temperature variation produced by the ion impingement during plasma cleaning and subsequent film deposition was used to modify the film microstructure by controlling the different degrees of strain applied to the substrate. The film microstructure is studied by top view and cross sectional SEM. The observed patch sizes are correlated with the variation of temperature that occurred during deposition. Finally, the chemical bonding of the samples is studied by Raman spectroscopy. All the samples show similar spectra regardless the bias voltage used. (C) 2011 Elsevier B.V. All rights reserved.",

keywords = "Scanning electron microscopy (SEM), Plasma-assisted chemical vapor deposition (PACVD), Rubber, Raman spectroscopy, FILTERED-ARC-DEPOSITION, AMORPHOUS-CARBON, COATINGS",

author = "D. Martinez-Martinez and M. Schenkel and Y.T. Pei and J.C. S{\'a}nchez-L{\'o}pez and Hosson, {J.Th.M. De}",

note = "Relation: http://www.rug.nl/research/itm/ Rights: University of Groningen, Research Institute of Technology and Management; 12th International Conference on Plasma Surface Engineering ; Conference date: 13-09-2010 Through 17-09-2010",

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doi = "10.1016/j.surfcoat.2011.02.067",

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TY - JOUR

T1 - Microstructure and chemical bonding of DLC films deposited on ACM rubber by PACVD

AU - Martinez-Martinez, D.

AU - Schenkel, M.

AU - Pei, Y.T.

AU - Sánchez-López, J.C.

AU - Hosson, J.Th.M. De

N1 - Relation: http://www.rug.nl/research/itm/ Rights: University of Groningen, Research Institute of Technology and Management

PY - 2011/7/25

Y1 - 2011/7/25

N2 - The microstructure and chemical bonding of DLC films prepared by plasma assisted chemical vapor deposition on acrylic rubber (ACM) are studied in this paper. The temperature variation produced by the ion impingement during plasma cleaning and subsequent film deposition was used to modify the film microstructure by controlling the different degrees of strain applied to the substrate. The film microstructure is studied by top view and cross sectional SEM. The observed patch sizes are correlated with the variation of temperature that occurred during deposition. Finally, the chemical bonding of the samples is studied by Raman spectroscopy. All the samples show similar spectra regardless the bias voltage used. (C) 2011 Elsevier B.V. All rights reserved.

AB - The microstructure and chemical bonding of DLC films prepared by plasma assisted chemical vapor deposition on acrylic rubber (ACM) are studied in this paper. The temperature variation produced by the ion impingement during plasma cleaning and subsequent film deposition was used to modify the film microstructure by controlling the different degrees of strain applied to the substrate. The film microstructure is studied by top view and cross sectional SEM. The observed patch sizes are correlated with the variation of temperature that occurred during deposition. Finally, the chemical bonding of the samples is studied by Raman spectroscopy. All the samples show similar spectra regardless the bias voltage used. (C) 2011 Elsevier B.V. All rights reserved.

KW - Scanning electron microscopy (SEM)

KW - Plasma-assisted chemical vapor deposition (PACVD)

KW - Rubber

KW - Raman spectroscopy

KW - FILTERED-ARC-DEPOSITION

KW - AMORPHOUS-CARBON

KW - COATINGS

U2 - 10.1016/j.surfcoat.2011.02.067

DO - 10.1016/j.surfcoat.2011.02.067

M3 - Article

SN - 0257-8972

VL - 205

SP - S75-S78

JO - Surface & Coatings Technology

JF - Surface & Coatings Technology

T2 - 12th International Conference on Plasma Surface Engineering

Y2 - 13 September 2010 through 17 September 2010

ER -

Microstructure and chemical bonding of DLC films deposited on ACM rubber by PACVD

Abstract

Keywords

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