ON THE MORPHOLOGY OF A LAMELLAR TRIBLOCK COPOLYMER FILM

WH DEJEU; P LAMBOOY; IW HAMLEY; D VAKNIN; JS PEDERSEN; K KJAER; R SEYGER; P VANHUTTEN; G HADZIIOANNOU

ON THE MORPHOLOGY OF A LAMELLAR TRIBLOCK COPOLYMER FILM

WH DEJEU^*
, P LAMBOOY
, IW HAMLEY
, D VAKNIN
, JS PEDERSEN
, K KJAER
, R SEYGER
, P VANHUTTEN
, G HADZIIOANNOU

^*Corresponding author for this work

Stratingh Institute for Chemistry

Research output: Contribution to journal › Article › Academic › peer-review

Abstract

X-ray and neutron reflectivity are used to study the morphology of a triblock copolymer of d-poly(styrene) and poly(2-vinylpyridine) in the form P2VP30-dPS60-P2VP30 deposited as a film on a silicon wafer. Microphase separation leads to a lamellar film which is strongly quantized in layers of about 300 angstrom each and with P2VP at the silicon substrate. The confinement of the polymer ends to the same plane leads for the top layer to a > of the polymer, so that the middle PS part can still wet the air interface completely.

Original language	English
Pages (from-to)	139-146
Number of pages	8
Journal	Journal de Physique II
Volume	3
Issue number	1
Publication status	Published - Jan-1993

Keywords

MOLECULAR-WEIGHT DEPENDENCE
DIBLOCK COPOLYMERS
NEUTRON REFLECTIVITY
MICELLE FORMATION
BLOCK
HOMOPOLYMERS
INTERFACE

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title = "ON THE MORPHOLOGY OF A LAMELLAR TRIBLOCK COPOLYMER FILM",

abstract = "X-ray and neutron reflectivity are used to study the morphology of a triblock copolymer of d-poly(styrene) and poly(2-vinylpyridine) in the form P2VP30-dPS60-P2VP30 deposited as a film on a silicon wafer. Microphase separation leads to a lamellar film which is strongly quantized in layers of about 300 angstrom each and with P2VP at the silicon substrate. The confinement of the polymer ends to the same plane leads for the top layer to a > of the polymer, so that the middle PS part can still wet the air interface completely.",

keywords = "MOLECULAR-WEIGHT DEPENDENCE, DIBLOCK COPOLYMERS, NEUTRON REFLECTIVITY, MICELLE FORMATION, BLOCK, HOMOPOLYMERS, INTERFACE",

author = "WH DEJEU and P LAMBOOY and IW HAMLEY and D VAKNIN and JS PEDERSEN and K KJAER and R SEYGER and P VANHUTTEN and G HADZIIOANNOU",

year = "1993",

month = jan,

language = "English",

volume = "3",

pages = "139--146",

journal = "Journal de Physique II",

issn = "1155-4312",

number = "1",

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T1 - ON THE MORPHOLOGY OF A LAMELLAR TRIBLOCK COPOLYMER FILM

AU - DEJEU, WH

AU - LAMBOOY, P

AU - HAMLEY, IW

AU - VAKNIN, D

AU - PEDERSEN, JS

AU - KJAER, K

AU - SEYGER, R

AU - VANHUTTEN, P

AU - HADZIIOANNOU, G

PY - 1993/1

Y1 - 1993/1

N2 - X-ray and neutron reflectivity are used to study the morphology of a triblock copolymer of d-poly(styrene) and poly(2-vinylpyridine) in the form P2VP30-dPS60-P2VP30 deposited as a film on a silicon wafer. Microphase separation leads to a lamellar film which is strongly quantized in layers of about 300 angstrom each and with P2VP at the silicon substrate. The confinement of the polymer ends to the same plane leads for the top layer to a > of the polymer, so that the middle PS part can still wet the air interface completely.

AB - X-ray and neutron reflectivity are used to study the morphology of a triblock copolymer of d-poly(styrene) and poly(2-vinylpyridine) in the form P2VP30-dPS60-P2VP30 deposited as a film on a silicon wafer. Microphase separation leads to a lamellar film which is strongly quantized in layers of about 300 angstrom each and with P2VP at the silicon substrate. The confinement of the polymer ends to the same plane leads for the top layer to a > of the polymer, so that the middle PS part can still wet the air interface completely.

KW - MOLECULAR-WEIGHT DEPENDENCE

KW - DIBLOCK COPOLYMERS

KW - NEUTRON REFLECTIVITY

KW - MICELLE FORMATION

KW - BLOCK

KW - HOMOPOLYMERS

KW - INTERFACE

M3 - Article

SN - 1155-4312

VL - 3

SP - 139

EP - 146

JO - Journal de Physique II

JF - Journal de Physique II

IS - 1

ER -

ON THE MORPHOLOGY OF A LAMELLAR TRIBLOCK COPOLYMER FILM

Abstract

Keywords

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