On the S/W stoichiometry and triboperformance of WSxC(H) coatings deposited by magnetron sputtering

Huatang Cao, Feng Wen, Sumit Kumar, Petra Rudolf, Jeff Th. M. De Hosson, Yutao Pei*

*Corresponding author for this work

Research output: Contribution to journalArticleAcademicpeer-review

13 Citations (Scopus)
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Abstract

WSxC(H) coatings were deposited on single crystal silicon(100) wafers by magnetron co-sputtering and reactive sputtering at various target-substrate distances. Upon increasing the distance, the stoichiometric S/W ratio increases from 0.51 to 1.89. Also, the porosity of coatings gradually augments and a columnar microstructure tends to form. Preferential sulfur resputtering rather than contaminations primarily accounts for the low S/W ratio. TEM reveals randomly oriented WS2(002) platelets in the WSxC coatings when deposited at a large distance, which is supported by XRD. The composite coatings exhibit a decreasing hardness and elastic modulus with increasing target-substrate distance. The triboperformance is strongly affected by the coating composition, the target-substrate distance and the testing environment. Cross-sectional TEM of formed tribofilms reveals an obvious reorientation of WS2(002) basal planes parallel to the plane of sliding, leading to an ultralow friction.

Original languageEnglish
Pages (from-to)41-51
Number of pages11
JournalSurface & Coatings Technology
Volume365
Early online date17-Apr-2018
DOIs
Publication statusPublished - 15-May-2019
Event14th International Conference on Plasma-Based Ion Implantation and Deposition (PBII and D) - Shanghai
Duration: 17-Oct-201720-Oct-2017

Keywords

  • WS2
  • Coating
  • Target-substrate distance
  • Magnetron cosputtering and reactive sputtering
  • Stoichiometry
  • Tribology
  • W-S-C
  • TRIBOLOGICAL PROPERTIES
  • THIN-FILMS
  • NANOCOMPOSITE COATINGS
  • ELECTRONIC-STRUCTURE
  • FRICTION
  • TUNGSTEN
  • WEAR
  • BEHAVIOR
  • MICROSTRUCTURE

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