Physics of laser-produced plasma sources of extreme ultraviolet radiation

O.O. Versolato; D. Kurilovich; F. Torretti; R. Schupp; J. Scheers; M.J. Deuzeman; A. Bayerle; R. Hoekstra; W. Ubachs

doi:10.1364/EUVXRAY.2018.ET3B.4

Physics of laser-produced plasma sources of extreme ultraviolet radiation

O.O. Versolato, D. Kurilovich, F. Torretti, R. Schupp, J. Scheers, M.J. Deuzeman, A. Bayerle, R. Hoekstra, W. Ubachs

Quantum Interactions and Structural Dynamics

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

Abstract

Laser-produced tin plasmas are used for the generation of extreme ultraviolet light for nanolithography. We use an extensive diagnostic toolset to characterize and understand the physics of these plasma light sources at the atomic level.

Original language	English
Title of host publication	Compact EUV & X-ray Light Sources
Subtitle of host publication	Proceedings
Place of Publication	Washington, D.C.
Publisher	Optica Publishing Group (formerly OSA)
Pages	paper ET3B.4
ISBN (Print)	978-1-943580-40-8
DOIs	https://doi.org/10.1364/EUVXRAY.2018.ET3B.4
Publication status	Published - 2018
Event	Compact EUV & X-ray Light Sources 2018 Strasbourg France 26–28 March 2018 - Strasbourg , France Duration: 26-Feb-2018 → 28-Mar-2018

Conference

Conference	Compact EUV & X-ray Light Sources 2018 Strasbourg France 26–28 March 2018
Country/Territory	France
City	Strasbourg
Period	26/02/2018 → 28/03/2018

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10.1364/EUVXRAY.2018.ET3B.4

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@inproceedings{a00174107374497ba30a91b9b0e8e181,

title = "Physics of laser-produced plasma sources of extreme ultraviolet radiation",

abstract = "Laser-produced tin plasmas are used for the generation of extreme ultraviolet light for nanolithography. We use an extensive diagnostic toolset to characterize and understand the physics of these plasma light sources at the atomic level.",

author = "O.O. Versolato and D. Kurilovich and F. Torretti and R. Schupp and J. Scheers and M.J. Deuzeman and A. Bayerle and R. Hoekstra and W. Ubachs",

year = "2018",

doi = "10.1364/EUVXRAY.2018.ET3B.4",

language = "English",

isbn = "978-1-943580-40-8",

pages = " paper ET3B.4",

booktitle = "Compact EUV & X-ray Light Sources",

publisher = "Optica Publishing Group (formerly OSA)",

note = "Compact EUV & X-ray Light Sources 2018 Strasbourg France 26–28 March 2018 ; Conference date: 26-02-2018 Through 28-03-2018",

}

Versolato, OO, Kurilovich, D, Torretti, F, Schupp, R, Scheers, J, Deuzeman, MJ, Bayerle, A, Hoekstra, R & Ubachs, W 2018, Physics of laser-produced plasma sources of extreme ultraviolet radiation. in Compact EUV & X-ray Light Sources: Proceedings. Optica Publishing Group (formerly OSA), Washington, D.C., pp. paper ET3B.4, Compact EUV & X-ray Light Sources 2018

Strasbourg France
26–28 March 2018, Strasbourg , France, 26/02/2018. https://doi.org/10.1364/EUVXRAY.2018.ET3B.4

Physics of laser-produced plasma sources of extreme ultraviolet radiation. / Versolato, O.O.; Kurilovich, D.; Torretti, F. et al.
Compact EUV & X-ray Light Sources: Proceedings. Washington, D.C.: Optica Publishing Group (formerly OSA), 2018. p. paper ET3B.4.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Physics of laser-produced plasma sources of extreme ultraviolet radiation

AU - Versolato, O.O.

AU - Kurilovich, D.

AU - Torretti, F.

AU - Schupp, R.

AU - Scheers, J.

AU - Deuzeman, M.J.

AU - Bayerle, A.

AU - Hoekstra, R.

AU - Ubachs, W.

PY - 2018

Y1 - 2018

N2 - Laser-produced tin plasmas are used for the generation of extreme ultraviolet light for nanolithography. We use an extensive diagnostic toolset to characterize and understand the physics of these plasma light sources at the atomic level.

AB - Laser-produced tin plasmas are used for the generation of extreme ultraviolet light for nanolithography. We use an extensive diagnostic toolset to characterize and understand the physics of these plasma light sources at the atomic level.

UR - http://www.scopus.com/inward/record.url?eid=2-s2.0-85047111493&partnerID=MN8TOARS

U2 - 10.1364/EUVXRAY.2018.ET3B.4

DO - 10.1364/EUVXRAY.2018.ET3B.4

M3 - Conference contribution

SN - 978-1-943580-40-8

SP - paper ET3B.4

BT - Compact EUV & X-ray Light Sources

PB - Optica Publishing Group (formerly OSA)

CY - Washington, D.C.

T2 - Compact EUV & X-ray Light Sources 2018 Strasbourg France 26–28 March 2018

Y2 - 26 February 2018 through 28 March 2018

ER -

Physics of laser-produced plasma sources of extreme ultraviolet radiation

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