Preparation and Characterisation of Exfoliated Graphene for Quantum Resistance Metrology

G. Rietveld; H.J. van Elferen; A.J.M. Giesbers; A. Veligura; U. Zeitler; K.S. Novoselov; B.J. van Wees; A.K. Geim; J.C. Maan

Preparation and Characterisation of Exfoliated Graphene for Quantum Resistance Metrology

G. Rietveld, H.J. van Elferen, A.J.M. Giesbers, A. Veligura, U. Zeitler, K.S. Novoselov, B.J. van Wees, A.K. Geim, J.C. Maan

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Abstract

Exfoliated graphene samples have been prepared for use in quantum resistance metrology. Good progress is recently made in achieving contact resistances to graphene of less than 50 Ω. Details are presented on the handling and measurement of graphene samples.

Original language	English
Title of host publication	2010 Conference on Precision Electromagnetic Measurements
Publisher	University of Groningen, The Zernike Institute for Advanced Materials
Pages	627-628
Number of pages	2
ISBN (Print)	9781424467952
Publication status	Published - 2010
Event	Conference on Precision Electromagnetic Measurements, Daejeon Convention Center, Daejeon, Korea - Duration: 13-Jun-2010 → 18-Jun-2010

Conference

Conference	Conference on Precision Electromagnetic Measurements, Daejeon Convention Center, Daejeon, Korea
Period	13/06/2010 → 18/06/2010

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Rietveld, G., Elferen, H. J. V., Giesbers, A. J. M., Veligura, A., Zeitler, U., Novoselov, K. S., Wees, B. J. V., Geim, A. K., & Maan, J. C. (2010). Preparation and Characterisation of Exfoliated Graphene for Quantum Resistance Metrology. In 2010 Conference on Precision Electromagnetic Measurements (pp. 627-628). University of Groningen, The Zernike Institute for Advanced Materials.

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title = "Preparation and Characterisation of Exfoliated Graphene for Quantum Resistance Metrology",

abstract = "Exfoliated graphene samples have been prepared for use in quantum resistance metrology. Good progress is recently made in achieving contact resistances to graphene of less than 50 Ω. Details are presented on the handling and measurement of graphene samples.",

author = "G. Rietveld and Elferen, {H.J. van} and A.J.M. Giesbers and A. Veligura and U. Zeitler and K.S. Novoselov and Wees, {B.J. van} and A.K. Geim and J.C. Maan",

note = "Relation: http://www.rug.nl/zernike/ Rights: University of Groningen, Zernike Institute for Advanced Materials; Conference on Precision Electromagnetic Measurements, Daejeon Convention Center, Daejeon, Korea ; Conference date: 13-06-2010 Through 18-06-2010",

year = "2010",

language = "English",

isbn = "9781424467952",

pages = "627--628",

booktitle = "2010 Conference on Precision Electromagnetic Measurements",

publisher = "University of Groningen, The Zernike Institute for Advanced Materials",

}

Rietveld, G, Elferen, HJV, Giesbers, AJM, Veligura, A, Zeitler, U, Novoselov, KS, Wees, BJV, Geim, AK & Maan, JC 2010, Preparation and Characterisation of Exfoliated Graphene for Quantum Resistance Metrology. in 2010 Conference on Precision Electromagnetic Measurements. University of Groningen, The Zernike Institute for Advanced Materials, pp. 627-628, Conference on Precision Electromagnetic Measurements, Daejeon Convention Center, Daejeon, Korea, 13/06/2010.

Preparation and Characterisation of Exfoliated Graphene for Quantum Resistance Metrology. / Rietveld, G.; Elferen, H.J. van; Giesbers, A.J.M. et al.
2010 Conference on Precision Electromagnetic Measurements. University of Groningen, The Zernike Institute for Advanced Materials, 2010. p. 627-628.

Research output: Chapter in Book/Report/Conference proceeding › Chapter › Academic

TY - CHAP

T1 - Preparation and Characterisation of Exfoliated Graphene for Quantum Resistance Metrology

AU - Rietveld, G.

AU - Elferen, H.J. van

AU - Giesbers, A.J.M.

AU - Veligura, A.

AU - Zeitler, U.

AU - Novoselov, K.S.

AU - Wees, B.J. van

AU - Geim, A.K.

AU - Maan, J.C.

N1 - Relation: http://www.rug.nl/zernike/ Rights: University of Groningen, Zernike Institute for Advanced Materials

PY - 2010

Y1 - 2010

N2 - Exfoliated graphene samples have been prepared for use in quantum resistance metrology. Good progress is recently made in achieving contact resistances to graphene of less than 50 Ω. Details are presented on the handling and measurement of graphene samples.

AB - Exfoliated graphene samples have been prepared for use in quantum resistance metrology. Good progress is recently made in achieving contact resistances to graphene of less than 50 Ω. Details are presented on the handling and measurement of graphene samples.

M3 - Chapter

SN - 9781424467952

SP - 627

EP - 628

BT - 2010 Conference on Precision Electromagnetic Measurements

PB - University of Groningen, The Zernike Institute for Advanced Materials

T2 - Conference on Precision Electromagnetic Measurements, Daejeon Convention Center, Daejeon, Korea

Y2 - 13 June 2010 through 18 June 2010

ER -

Preparation and Characterisation of Exfoliated Graphene for Quantum Resistance Metrology

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