Prominent radiative contributions from multiply-excited states in laser-produced tin plasma for nanolithography

F. Torretti, J. Sheil, R. Schupp, M. M. Basko, M. Bayraktar, R. A. Meijer, S. Witte, W. Ubachs, R. Hoekstra, O. O. Versolato*, A. J. Neukirch, J. Colgan*

*Corresponding author for this work

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Keyphrases

Engineering

Physics

Material Science