The author investigates quantitatively the influence of random surface roughness on the quality factor Q of nanoresonators due to noise by impinging gas molecules. The roughness is characterized by the amplitude w, the correlation length xi, and the roughness exponent H that describes fine roughness details at short wavelengths. Surface roughening (decreasing H and increasing ratio w/xi) leads to lower Q, which translates to lower sensitivity to external perturbations, and a higher limit to mass sensitivity. The influence of the exponent H is shown to be important as that of w/xi, indicating the necessity for precise control of the surface morphology. (c) 2007 American Institute of Physics.
- NANOELECTROMECHANICAL SYSTEMS
- NANOMECHANICAL RESONATORS
- QUALITY FACTORS