Random surface roughness influence on gas damped nanoresonators

G. Palasantzas*

*Corresponding author for this work

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Abstract

The author investigates quantitatively the influence of random surface roughness on the quality factor Q of nanoresonators due to noise by impinging gas molecules. The roughness is characterized by the amplitude w, the correlation length xi, and the roughness exponent H that describes fine roughness details at short wavelengths. Surface roughening (decreasing H and increasing ratio w/xi) leads to lower Q, which translates to lower sensitivity to external perturbations, and a higher limit to mass sensitivity. The influence of the exponent H is shown to be important as that of w/xi, indicating the necessity for precise control of the surface morphology. (c) 2007 American Institute of Physics.
Original languageEnglish
Article number041914
Number of pages3
JournalApplied Physics Letters
Volume90
Issue number4
DOIs
Publication statusPublished - 22-Jan-2007

Keywords

  • NANOELECTROMECHANICAL SYSTEMS
  • NANOMECHANICAL RESONATORS
  • NANOCRYSTALLINE-DIAMOND
  • INTERNAL-FRICTION
  • QUALITY FACTORS
  • CANTILEVERS
  • OSCILLATOR
  • DEPENDENCE
  • PRESSURE
  • SPECTRUM

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