Abstract
The author investigates quantitatively the influence of random surface roughness on the quality factor Q of nanoresonators due to noise by impinging gas molecules. The roughness is characterized by the amplitude w, the correlation length xi, and the roughness exponent H that describes fine roughness details at short wavelengths. Surface roughening (decreasing H and increasing ratio w/xi) leads to lower Q, which translates to lower sensitivity to external perturbations, and a higher limit to mass sensitivity. The influence of the exponent H is shown to be important as that of w/xi, indicating the necessity for precise control of the surface morphology. (c) 2007 American Institute of Physics.
| Original language | English |
|---|---|
| Article number | 041914 |
| Number of pages | 3 |
| Journal | Applied Physics Letters |
| Volume | 90 |
| Issue number | 4 |
| DOIs | |
| Publication status | Published - 22-Jan-2007 |
Keywords
- NANOELECTROMECHANICAL SYSTEMS
- NANOMECHANICAL RESONATORS
- NANOCRYSTALLINE-DIAMOND
- INTERNAL-FRICTION
- QUALITY FACTORS
- CANTILEVERS
- OSCILLATOR
- DEPENDENCE
- PRESSURE
- SPECTRUM