Recent Advances in Modeling Laser-Driven EUV Light Source Plasmas for Nanolithography

John Sheil, Diko J. Hemminga, Mikhail M. Basko, Wim Ubachs, Ronnie Hoekstra, Amanda J. Neukirch, James Colgan, Oscar O. Versolato

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Abstract

The light source in extreme ultraviolet (EUV) lithography tools is a hot and dense laser-driven plasma. We will give an overview of our recent work on modeling the radiative and expansion characteristics of these plasmas.

Original languageEnglish
Title of host publicationCompact EUV and X-ray Light Sources, EUVXRAY 2022
PublisherOptica Publishing Group (formerly OSA)
ISBN (Electronic)9781957171067
Publication statusPublished - 2022
EventCompact EUV and X-ray Light Sources, EUVXRAY 2022 - Budapest, Hungary
Duration: 21-Mar-202225-Mar-2022

Publication series

NameOptics InfoBase Conference Papers

Conference

ConferenceCompact EUV and X-ray Light Sources, EUVXRAY 2022
Country/TerritoryHungary
CityBudapest
Period21/03/202225/03/2022

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