Self-organization of linear nanochannel networks

R. K. Annabattula*, J. M. Veenstra, Y. F. Mei, O. G. Schmidt, P. R. Onck

*Corresponding author for this work

Research output: Contribution to journalArticleAcademicpeer-review

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Abstract

A theoretical study has been conducted to explore the mechanics of self-organizing channel networks with dimensions in the submicron range and nanorange. The channels form by the partial release and bond back of prestressed thin films. In the release phase, the film spontaneously buckles into wrinkles of a certain wavelength, followed by a bond-back phase in which the final channel geometry is established through cohesive interface attractions. Results are presented in terms of the channel spacing, height, and width as a function of the film stiffness, thickness, eigenstrain, etch width, and interface energy. We have identified two dimensionless parameters that fully quantify the network assembly, showing excellent agreement with experiments. Our results provide valuable insight for the design of submicron and nanoscale channel networks with specific geometries.

Original languageEnglish
Article number224114
Pages (from-to)224114-1-224114-9
Number of pages9
JournalPhysical Review. B: Condensed Matter and Materials Physics
Volume81
Issue number22
DOIs
Publication statusPublished - 24-Jun-2010

Keywords

  • CAPILLARY ARRAY ELECTROPHORESIS
  • THIN-FILMS
  • HIGH-SPEED
  • DELAMINATION
  • FABRICATION
  • POLYMER
  • PLATES

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