Silicon containing resist materials based on chemical amplification

JC van de Grampel*, R Puyenbroek, BAC Rousseeuw, EWJM an der Drift

*Corresponding author for this work

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    Abstract

    Two classes of siloxane polymers applicable as resist materials are being described. In the first series of materials acid-sensitive substituents as t-butoxycarbonyloxy, or t-butoxy are linked to a polysiloxane backbone. Preparation of these polymers occurs via hydrosilylation of polymethylhydrosiloxane with suitable olefins. The second class concerns graftcopolymers and/or tercopolymers in which acid-sensitive groups are attached to a carbon backbone in combination with grafted polysiloxane chains. These polymers are synthesized by free radical polymerization of olefins and silicon macromers. In microlithographic experiments two-layer resist systems have been irradiated with e-beam or DUV, the top layer being a silicon-containing polymer in combination with a catalytic amount of a photoacid generator. In general a high sensitivity was observed combined with a high oxygen RIE resistance.

    Original languageEnglish
    Title of host publicationINORGANIC AND ORGANOMETALLIC POLYMERS II
    EditorsP WisianNeilson, HR Allcock, KJ Wynne
    Place of PublicationWASHINGTON
    PublisherAMER CHEMICAL SOC
    Pages81-91
    Number of pages11
    ISBN (Print)0-8412-3036-6
    Publication statusPublished - 1994
    EventSymposium on Inorganic and Organometallic Polymers II - Advanced Materials and Intermediates, at the 205th National Meeting of the American-Chemical-Society - , Colombia
    Duration: 28-Mar-19932-Apr-1993

    Publication series

    NameACS SYMPOSIUM SERIES
    PublisherAMER CHEMICAL SOC
    Volume572
    ISSN (Print)0097-6156

    Other

    OtherSymposium on Inorganic and Organometallic Polymers II - Advanced Materials and Intermediates, at the 205th National Meeting of the American-Chemical-Society
    Country/TerritoryColombia
    Period28/03/199302/04/1993

    Keywords

    • COPOLYMERS
    • CHEMISTRY
    • DESIGN

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