Solvent-vapor-assisted imprint lithography

Nicoleta E. Voicu, Sabine Ludwigs*, Edward J. W. Crossland, Piers Andrew, Ullrich Steiner

*Corresponding author for this work

Research output: Contribution to journalArticleAcademicpeer-review

45 Citations (Scopus)

Abstract

Sub-micrometer features are replicated into high-molecular-weight polymer resists by using solvent-assisted nanoimprint lithography (see figure). By swelling the polymer in a controlled solvent-vapor atmosphere, millibar pressures and ambient temperatures are sufficient to achieve high-fidelity replication.

Original languageEnglish
Pages (from-to)757-+
Number of pages6
JournalAdvanced materials
Volume19
Issue number5
DOIs
Publication statusPublished - 5-Mar-2007

Keywords

  • NANOIMPRINT LITHOGRAPHY
  • DIFFUSION

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