Structural effects due to the incorporation of Ar atoms in the lattice of ZrO2 thin films prepared by ion beam assisted deposition

J.P. Holgado, R. Escobar Galindo, A. van Veen, H. Schut, J.T.M. de Hosson, A.R. Gonzalez-Elipe

Research output: Contribution to journalArticleAcademicpeer-review

10 Citations (Scopus)
317 Downloads (Pure)
Original languageDutch
Article numberPII S0168-583X(02)00695-X
Pages (from-to)333 - 345
Number of pages13
JournalNuclear Instruments & Methods in Physics Research Section B-Beam Interactions with Materials and Atoms
Volume194
Issue number3
DOIs
Publication statusPublished - 2002

Keywords

  • chemical vapour deposition
  • ion bombardment
  • thin film
  • positron annihilation
  • phase transformation
  • ion assisted deposition
  • ZrO2
  • CHEMICAL-VAPOR-DEPOSITION
  • STABILIZED ZIRCONIA FILMS
  • INDUCED CVD
  • GROWTH
  • SPECTROSCOPY
  • LAYERS
  • MOCVD

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