Sub-10 nm Features Obtained from Directed Self-Assembly of Semicrystalline Polycarbosilane-Based Block Copolymer Thin Films

Karim Aissou; Muhammad Mumtaz; Guillaume Fleury; Giuseppe Portale; Christophe Navarro; Eric Cloutet; Cyril Brochon; Caroline A. Ross; Georges Hadziioannou

doi:10.1002/adma.201404077

Sub-10 nm Features Obtained from Directed Self-Assembly of Semicrystalline Polycarbosilane-Based Block Copolymer Thin Films

Karim Aissou, Muhammad Mumtaz, Guillaume Fleury^*, Giuseppe Portale, Christophe Navarro, Eric Cloutet, Cyril Brochon, Caroline A. Ross, Georges Hadziioannou

^*Corresponding author for this work

Research output: Contribution to journal › Article › Academic › peer-review

78 Citations (Scopus)

Abstract

Highly-ordered arrays with sub-10 nm features are produced with topographical-directed self-assembly of low-molecular-weight poly(1,1-dimethyl silacyclobutane)block-poly(methyl methacrylate). This system turns out to be of high interest for lithographic applications since the domain orientation is solely controlled through the polymer layer thickness, while the promotion of the microphase separation is obtained by a short thermal annealing process under mild conditions.

[GRAPHICS]

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Original language	English
Pages (from-to)	261-265
Number of pages	5
Journal	Advanced materials
Volume	27
Issue number	2
DOIs	https://doi.org/10.1002/adma.201404077
Publication status	Published - 14-Jan-2015
Externally published	Yes

Keywords

RING-OPENING POLYMERIZATION
DIBLOCK COPOLYMER
TEMPLATES
LITHOGRAPHY
ARRAYS

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title = "Sub-10 nm Features Obtained from Directed Self-Assembly of Semicrystalline Polycarbosilane-Based Block Copolymer Thin Films",

abstract = "Highly-ordered arrays with sub-10 nm features are produced with topographical-directed self-assembly of low-molecular-weight poly(1,1-dimethyl silacyclobutane)block-poly(methyl methacrylate). This system turns out to be of high interest for lithographic applications since the domain orientation is solely controlled through the polymer layer thickness, while the promotion of the microphase separation is obtained by a short thermal annealing process under mild conditions.[GRAPHICS].",

keywords = "RING-OPENING POLYMERIZATION, DIBLOCK COPOLYMER, TEMPLATES, LITHOGRAPHY, ARRAYS",

author = "Karim Aissou and Muhammad Mumtaz and Guillaume Fleury and Giuseppe Portale and Christophe Navarro and Eric Cloutet and Cyril Brochon and Ross, {Caroline A.} and Georges Hadziioannou",

year = "2015",

month = jan,

day = "14",

doi = "10.1002/adma.201404077",

language = "English",

volume = "27",

pages = "261--265",

journal = "Advanced materials",

issn = "0935-9648",

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}

TY - JOUR

T1 - Sub-10 nm Features Obtained from Directed Self-Assembly of Semicrystalline Polycarbosilane-Based Block Copolymer Thin Films

AU - Aissou, Karim

AU - Mumtaz, Muhammad

AU - Fleury, Guillaume

AU - Portale, Giuseppe

AU - Navarro, Christophe

AU - Cloutet, Eric

AU - Brochon, Cyril

AU - Ross, Caroline A.

AU - Hadziioannou, Georges

PY - 2015/1/14

Y1 - 2015/1/14

N2 - Highly-ordered arrays with sub-10 nm features are produced with topographical-directed self-assembly of low-molecular-weight poly(1,1-dimethyl silacyclobutane)block-poly(methyl methacrylate). This system turns out to be of high interest for lithographic applications since the domain orientation is solely controlled through the polymer layer thickness, while the promotion of the microphase separation is obtained by a short thermal annealing process under mild conditions.[GRAPHICS].

AB - Highly-ordered arrays with sub-10 nm features are produced with topographical-directed self-assembly of low-molecular-weight poly(1,1-dimethyl silacyclobutane)block-poly(methyl methacrylate). This system turns out to be of high interest for lithographic applications since the domain orientation is solely controlled through the polymer layer thickness, while the promotion of the microphase separation is obtained by a short thermal annealing process under mild conditions.[GRAPHICS].

KW - RING-OPENING POLYMERIZATION

KW - DIBLOCK COPOLYMER

KW - TEMPLATES

KW - LITHOGRAPHY

KW - ARRAYS

U2 - 10.1002/adma.201404077

DO - 10.1002/adma.201404077

M3 - Article

SN - 0935-9648

VL - 27

SP - 261

EP - 265

JO - Advanced materials

JF - Advanced materials

IS - 2

ER -

Sub-10 nm Features Obtained from Directed Self-Assembly of Semicrystalline Polycarbosilane-Based Block Copolymer Thin Films

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Keywords

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