Tellurium in silicon: Part I: Channeling and rutherford backscattering studies of tellurium implanted silicon

GJ Kemerink^*, D.O. Boerma, Hendrik de Waard , L. Niesen

^*Corresponding author for this work

Research output: Contribution to journal › Article › Academic › peer-review

8 Citations (Scopus)

Original language	English
Pages (from-to)	83-99
Number of pages	17
Journal	Radiation Effects and Defects in Solids
Volume	69
Issue number	1-2
DOIs	https://doi.org/10.1080/00337578308221727
Publication status	Published - 1983

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@article{335a1e43b5cb4caeb843486c87139fba,

title = "Tellurium in silicon: Part I: Channeling and rutherford backscattering studies of tellurium implanted silicon",

author = "GJ Kemerink and D.O. Boerma and {de Waard}, Hendrik and L. Niesen",

year = "1983",

doi = "10.1080/00337578308221727",

language = "English",

volume = "69",

pages = "83--99",

journal = "Radiation Effects and Defects in Solids",

issn = "1042-0150",

publisher = "Taylor & Francis Group",

number = "1-2",

}

TY - JOUR

T1 - Tellurium in silicon

T2 - Part I: Channeling and rutherford backscattering studies of tellurium implanted silicon

AU - Kemerink, GJ

AU - Boerma, D.O.

AU - de Waard , Hendrik

AU - Niesen, L.

PY - 1983

Y1 - 1983

U2 - 10.1080/00337578308221727

DO - 10.1080/00337578308221727

M3 - Article

SN - 1042-0150

VL - 69

SP - 83

EP - 99

JO - Radiation Effects and Defects in Solids

JF - Radiation Effects and Defects in Solids

IS - 1-2

ER -