Temperature dependence of the growth front roughening of oligomer films

D. Tsamouras, G. Palasantzas

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Abstract

Growth front roughening characteristics of vacuum deposited pentamer 2,5-di-n-octyloxy-1,4-bis[4-(styryl)styryl]-benzene oligomer thin films, onto silicon substrates, strongly depend on the substrate temperature in the range ∼20 °C–100 °C. The measured roughness exponents H increase from H≈0.4 at low substrate temperatures where growth is dominated by vacancy formation, to H≈0.7–0.8 at elevated temperatures where diffusive growth takes place. Moreover, the root-mean-square roughness amplitude and the correlation length evolve with temperature closely as an Arrhenius process with activation barrier comparable to molecule transnational and rotational barriers on oligomer surfaces.
Original languageEnglish
Pages (from-to)4528 - 4530
Number of pages3
JournalApplied Physics Letters
Volume80
Issue number24
DOIs
Publication statusPublished - 2002

Keywords

  • CHARGE-TRANSPORT
  • SCALING BEHAVIOR
  • THIN
  • MICROSCOPY
  • POLYMERS

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