The mobility of Na+, Li+, and K+ ions in thermally grown SiO2 films

  • G. Greeuw
  • , J. F. Verwey

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Abstract

Na+, Li+, and K+ ions have been implanted in thermally grown oxides (Tox =1000 °C) of metal‐oxide‐silicon structures. The mobilities of the Na+ and Li+ ions have been determined by means of the isothermal transient ionic current method in the temperature range 100–300 °C. The K+ mobility has been obtained by means of triangular voltage sweep measurements in the range 350–450 °C. The results show that the Na+ and the Li+ mobilities are not significantly different. The activation energies of the three measured mobilities are shown to agree with a quantitative model which has been developed by Anderson and Stuart [J. Am. Ceram. Soc. 37, 573 (1954)].
Original languageEnglish
Pages (from-to)2218-2224
Number of pages7
JournalJournal of Applied Physics
Volume56
Issue number8
DOIs
Publication statusPublished - 1984

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