Thickness dependent thermal capacitance of thin films with rough boundaries

G Palasantzas*

*Corresponding author for this work

Research output: Contribution to journalArticleAcademic

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Abstract

We investigated the thickness dependence of the thermal capacitance of thin films with evolving boundary roughness as a function of film thickness. Besides dynamic roughness evolution, also thickness variations of the film thermal conductivity were taken into account for the more general case of polycrystalline films. Nevertheless, the roughness evolution with film thickness is shown to be the dominant factor, modified by details of the corresponding scattering mechanisms that determine charge and heat carrier transport at low film thickness in comparison with the heat carrier mean bulk mean free path. (C) 2002 Elsevier Science Ltd. All rights reserved.

Original languageEnglish
Article numberPII S0038-1098(02)00184-9
Pages (from-to)523-526
Number of pages4
JournalSolid State Communications
Volume122
Issue number10
DOIs
Publication statusPublished - 2002

Keywords

  • heat capacity
  • heat conduction
  • surfaces and interfaces
  • thin films
  • MOLECULAR-BEAM EPITAXY
  • SURFACE-ROUGHNESS
  • METALLIC-FILMS
  • QUANTUM-WELLS
  • CONDUCTIVITY
  • HOMOEPITAXY
  • SCATTERING
  • GROWTH

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