Thin films of complexed block copolymers

Wendy van Zoelen, Gerrit ten Brinke*

*Corresponding author for this work

Research output: Contribution to journalReview articleAcademicpeer-review

101 Citations (Scopus)
621 Downloads (Pure)

Abstract

Due to their ability to microphase separate into well ordered structures with periodicities on the nanometre scale, block copolymers have received widespread attention as building blocks for the fabrication of nanomaterials. In particular, thin films of block copolymers promise new technological breakthroughs in e. g. computer memory applications. This Review gives a short overview of progress that has been made in preparing suitable thin films of conventional coil coil diblock copolymer systems, while the advantages as well as the complexities of using more unconventional systems such as triblock copolymers and supramolecular systems are emphasized.

Original languageEnglish
Pages (from-to)1568-1582
Number of pages15
JournalSoft Matter
Volume5
Issue number8
DOIs
Publication statusPublished - 2009

Keywords

  • ABC TRIBLOCK COPOLYMERS
  • SUPRAMOLECULAR DIBLOCK COPOLYMER
  • SURFACE-MORPHOLOGY EVOLUTION
  • ORDER-DISORDER TRANSITIONS
  • SELF-ASSEMBLED STRUCTURES
  • MONTE-CARLO SIMULATIONS
  • PHASE-BEHAVIOR
  • NEUTRON REFLECTIVITY
  • PS-B-P4VP(PDP) SUPRAMOLECULES
  • FUNCTIONAL MATERIALS

Cite this