Wrinkled-up nanochannel networks: Long-range ordering, scalability, and X-ray investigation

Angelo Malachias, Yongfeng Mei*, Ratna K. Annabattula, Christoph Deneke, Patrick R. Onck, Oliver G. Schmidt

*Corresponding author for this work

Research output: Contribution to journalArticleAcademicpeer-review

44 Citations (Scopus)

Abstract

Highly ordered two-dimensional self-organized nanochannel networks as well as free-standing nanomembranes are produced on rigid substrates by means of III-V semiconductor compressively strained layers grown on top of an etchant-sensitive material. The releasing process is controlled by regularly spaced pits obtained from photolithography and a subsequent wet chemical etching. By tuning basic film parameters such as strain and thickness, one obtains periodic arrays of two-dimensional nanochannel networks with symmetries defined by the shape and periodicity of the photolithographic starting pits. Such nanochannel networks with a submicroscale lateral feature size exhibit a surprising flexibility with respect to the crystal lattice symmetry, retaining the original film crystalline quality as confirmed by X-ray grazing-incidence diffraction (GID) measurements. Finite element modeling helps in understanding the particular process of the cross-nanochannel formation.

Original languageEnglish
Pages (from-to)1715-1721
Number of pages7
JournalAcs Nano
Volume2
Issue number8
DOIs
Publication statusPublished - Aug-2008

Keywords

  • nanomembranes
  • wrinkles
  • nanochannels
  • photolithography
  • layer releasing
  • strain
  • long-range ordering
  • MICROFLUIDICS
  • TECHNOLOGY
  • SCALE

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