X-ray-reflectivity study of the growth kinetics of vapor-deposited silver films

C. Thompson, G. Palasantzas, Y.P. Feng, J. Krim

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Abstract

X-ray-reflectivity measurements have been carried out on silver films which were vapor deposited onto silicon substrates, to investigate the thickness evolution of the film’s surface roughness. The growth exponent was found to be β=0.26±0.05, and the roughness exponenet was found to be H=0.70±0.10.
Original languageEnglish
Number of pages7
JournalPhysical Review B
Volume49
Issue number7
DOIs
Publication statusPublished - 1994

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