Colloidal Quantum Dot Inks for Single-Step-Fabricated Field-Effect Transistors: The Importance of Postdeposition Ligand Removal

Daniel M. Balazs, Nisrina Rizkia, Hong-Hua Fang, Dmitry N. Dirin, Jamo Momand, Bart J. Kooi, Maksym V. Kovalenko, Maria Antonietta Loi*

*Bijbehorende auteur voor dit werk

OnderzoeksoutputAcademicpeer review

34 Citaten (Scopus)
354 Downloads (Pure)

Samenvatting

Colloidal quantum dots are a class of solution processed semiconductors with good prospects for photovoltaic and optoelectronic applications. Removal of the surfactant, so-called ligand exchange, is a crucial step in making the solid films conductive, but performing it in solid state introduces surface defects and cracks in the films. Hence, the formation of thick, device-grade films have only been possible through layer-by-layer processing, limiting the technological interest for quantum dot solids. Solution-phase ligand exchange before the deposition allows for the direct deposition of thick, homogeneous films suitable for device applications. In this work, fabrication of field-effect transistors in a single step is reported using blade-coating, an upscalable, industrially relevant technique. Most importantly, a postdeposition washing step results in device properties comparable to the best layer-by-layer processed devices, opening the way for large-scale fabrication and further interest from the research community.

Originele taal-2English
Pagina's (van-tot)5626-5632
Aantal pagina's7
TijdschriftACS Applied Materials & Interfaces
Volume10
Nummer van het tijdschrift6
DOI's
StatusPublished - 14-feb.-2018

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