Interface Segregating Fluoralkyl-Modified Polymers for High-Fidelity Block Copolymer Nanoimprint Lithography

Vincent Voet, T.E. Pick, S.M. Park, M. Moritz, A.T. Hammack, J.J. Urban, D.F. Ogltree, D.L. Olynick, B.A. Helms

Onderzoeksoutput › Academic › peer review

43 Citaten (Scopus)

Originele taal-2	English
Pagina's (van-tot)	2812
Tijdschrift	Journal of the American Chemical Society
Volume	133
Status	Published - 2011

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@article{0dd4a43f04074b25b6e23558253b7bc9,

title = "Interface Segregating Fluoralkyl-Modified Polymers for High-Fidelity Block Copolymer Nanoimprint Lithography",

author = "Vincent Voet and T.E. Pick and S.M. Park and M. Moritz and A.T. Hammack and J.J. Urban and D.F. Ogltree and D.L. Olynick and B.A. Helms",

year = "2011",

language = "English",

volume = "133",

pages = "2812",

journal = "Journal of the American Chemical Society",

issn = "0002-7863",

publisher = "AMER CHEMICAL SOC",

}

TY - JOUR

T1 - Interface Segregating Fluoralkyl-Modified Polymers for High-Fidelity Block Copolymer Nanoimprint Lithography

AU - Voet, Vincent

AU - Pick, T.E.

AU - Park, S.M.

AU - Moritz, M.

AU - Hammack, A.T.

AU - Urban, J.J.

AU - Ogltree, D.F.

AU - Olynick, D.L.

AU - Helms, B.A.

PY - 2011

Y1 - 2011

M3 - Article

VL - 133

SP - 2812

JO - Journal of the American Chemical Society

JF - Journal of the American Chemical Society

SN - 0002-7863

ER -