Interface Segregating Fluoralkyl-Modified Polymers for High-Fidelity Block Copolymer Nanoimprint Lithography

Vincent Voet, T.E. Pick, S.M. Park, M. Moritz, A.T. Hammack, J.J. Urban, D.F. Ogltree, D.L. Olynick, B.A. Helms

OnderzoeksoutputAcademicpeer review

43 Citaten (Scopus)
Originele taal-2English
Pagina's (van-tot)2812
TijdschriftJournal of the American Chemical Society
Volume133
StatusPublished - 2011

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