Micron-scale pattern formation in prestressed polygonal films

R. K. Annabattula*, P. R. Onck

*Bijbehorende auteur voor dit werk

OnderzoeksoutputAcademicpeer review

6 Citaten (Scopus)
238 Downloads (Pure)

Samenvatting

In this paper we explore the spontaneous formation of micropatterns in thin prestressed polygonal films using finite element simulations. We study films with different size, thickness, and shape, including square, rectangular, pentagonal, and hexagonal films. Patterns form when the films release the internal eigenstrain by buckling-up, after which the films bond-back to the substrate. After an initial symmetric evolution of the buckling profile, the symmetry of the deflection pattern breaks when the wavelength of wriggles near the film edges decreases. During bond back the deflection morphology converges to a fourfold, fivefold, and sixfold ridging pattern for the square, pentagonal and hexagonal films, respectively, showing a close resemblance with experimental film systems of similar size and shape. Rectangular films of large length to width ratio go through a transition in buckling shapes from the initial Euler mode, through the varicose mode into the antisymmetric telephone-cord mode. For all the film shapes, the ratio of the film height to the effective film width scales with the square root of eigenstrain and is independent of thickness. The bond-back mechanism determines the final wrinkle morphology and is governed by the eigenstrain value at the end of the buckling-up stage and the dimensionless parameter (Gamma/EW(eq))(W(eq)/t)(3), relating the interface energy to the strain energy in the film.
Originele taal-2English
Artikelnummer033517
Pagina's (van-tot)033517-1-033517-10
Aantal pagina's10
TijdschriftJournal of Applied Physics
Volume109
Nummer van het tijdschrift3
DOI's
StatusPublished - 1-feb-2011

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