TY - JOUR
T1 - Nonlinear Actuation Dynamics of Driven Casimir Oscillators with Rough Surfaces
AU - Broer, Wijnand
AU - Waalkens, Holger
AU - Svetovoy, Vitaly
AU - Knoester, Jasper
AU - Palasantzas, Georgios
PY - 2015/11/25
Y1 - 2015/11/25
N2 - At separations below 100 nm, Casimir-Lifshitz forces strongly influence the actuation dynamics of microelectromechanical systems (MEMS) in dry vacuum conditions. For a micron-size plate oscillating near a surface, which mimics a frequently used setup in experiments with MEMS, we show that the roughness of the surfaces significantly influences the qualitative dynamics of the oscillator. Via a combination of analytical and numerical methods, it is shown that surface roughness leads to a clear increase of initial conditions associated with chaotic motion, that eventually lead to stiction between the surfaces. Since stiction leads to a malfunction of MEMS oscillators, our results are of central interest for the design of microdevices. Moreover, stiction is of significance for fundamentally motivated experiments performed with MEMS.
AB - At separations below 100 nm, Casimir-Lifshitz forces strongly influence the actuation dynamics of microelectromechanical systems (MEMS) in dry vacuum conditions. For a micron-size plate oscillating near a surface, which mimics a frequently used setup in experiments with MEMS, we show that the roughness of the surfaces significantly influences the qualitative dynamics of the oscillator. Via a combination of analytical and numerical methods, it is shown that surface roughness leads to a clear increase of initial conditions associated with chaotic motion, that eventually lead to stiction between the surfaces. Since stiction leads to a malfunction of MEMS oscillators, our results are of central interest for the design of microdevices. Moreover, stiction is of significance for fundamentally motivated experiments performed with MEMS.
KW - SYSTEMS
U2 - 10.1103/PhysRevApplied.4.054016
DO - 10.1103/PhysRevApplied.4.054016
M3 - Article
SN - 2331-7019
VL - 4
JO - Physical Review Applied
JF - Physical Review Applied
IS - 5
M1 - 054016
ER -