On the optimum resolution of transmission-electron backscattered diffraction (t-EBSD)

R. van Bremen, D. Ribas Gomes, L. T. H. de Jeer, V. Ocelik*, J. Th. M. De Hosson

*Bijbehorende auteur voor dit werk

    OnderzoeksoutputAcademicpeer review

    42 Citaten (Scopus)
    2 Downloads (Pure)

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    The work presented aims at determining the optimum physical resolution of the transmission-electron backscattered diffraction (t-EBSD) technique. The resolution depends critically on intrinsic factors such as the density, atomic number and thickness of the specimen but also on the extrinsic experimental set-up of the electron beam voltage, specimen tilt and detector position. In the present study, the so-called physical resolution of a typical t-EBSD set-up was determined with the use of Monte Carlo simulations and confronted to experimental findings. In the case of a thin Au film of 20 nm, the best resolution obtained was 9 nm whereas for a 100 nm Au film the best resolution was 66 nm. The precise dependence of resolution on thickness was found to vary differently depending on the specific elements involved. This means that the resolution of each specimen should be determined individually. Experimentally the median probe size of the t-EBSD for a 140 nm thick AuAg specimen was measured to be 87 nm. The first and third quartiles of the probe size measurements were found to be 60 nm and 118 nm. Simulation of this specimen resulted in a resolution of 94 nm which fits between these quartiles. (C) 2015 Elsevier By. All rights reserved.

    Originele taal-2English
    Pagina's (van-tot)256-264
    Aantal pagina's9
    TijdschriftUltramicroscopy
    Volume160
    DOI's
    StatusPublished - jan-2016

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