Preparation and Characterisation of Exfoliated Graphene for Quantum Resistance Metrology

G. Rietveld; H.J. van Elferen; A.J.M. Giesbers; A. Veligura; U. Zeitler; K.S. Novoselov; B.J. van Wees; A.K. Geim; J.C. Maan

Preparation and Characterisation of Exfoliated Graphene for Quantum Resistance Metrology

G. Rietveld, H.J. van Elferen, A.J.M. Giesbers, A. Veligura, U. Zeitler, K.S. Novoselov, B.J. van Wees, A.K. Geim, J.C. Maan

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Exfoliated graphene samples have been prepared for use in quantum resistance metrology. Good progress is recently made in achieving contact resistances to graphene of less than 50 Ω. Details are presented on the handling and measurement of graphene samples.

Originele taal-2	English
Titel	2010 Conference on Precision Electromagnetic Measurements
Uitgeverij	University of Groningen, The Zernike Institute for Advanced Materials
Pagina's	627-628
Aantal pagina's	2
ISBN van geprinte versie	9781424467952
Status	Published - 2010
Evenement	Conference on Precision Electromagnetic Measurements, Daejeon Convention Center, Daejeon, Korea - Duur: 13-jun.-2010 → 18-jun.-2010

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Conference	Conference on Precision Electromagnetic Measurements, Daejeon Convention Center, Daejeon, Korea
Periode	13/06/2010 → 18/06/2010

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Rietveld, G., Elferen, H. J. V., Giesbers, A. J. M., Veligura, A., Zeitler, U., Novoselov, K. S., Wees, B. J. V., Geim, A. K., & Maan, J. C. (2010). Preparation and Characterisation of Exfoliated Graphene for Quantum Resistance Metrology. In 2010 Conference on Precision Electromagnetic Measurements (blz. 627-628). University of Groningen, The Zernike Institute for Advanced Materials.

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title = "Preparation and Characterisation of Exfoliated Graphene for Quantum Resistance Metrology",

abstract = "Exfoliated graphene samples have been prepared for use in quantum resistance metrology. Good progress is recently made in achieving contact resistances to graphene of less than 50 Ω. Details are presented on the handling and measurement of graphene samples.",

author = "G. Rietveld and Elferen, {H.J. van} and A.J.M. Giesbers and A. Veligura and U. Zeitler and K.S. Novoselov and Wees, {B.J. van} and A.K. Geim and J.C. Maan",

note = "Relation: http://www.rug.nl/zernike/ Rights: University of Groningen, Zernike Institute for Advanced Materials; Conference on Precision Electromagnetic Measurements, Daejeon Convention Center, Daejeon, Korea ; Conference date: 13-06-2010 Through 18-06-2010",

year = "2010",

language = "English",

isbn = "9781424467952",

pages = "627--628",

booktitle = "2010 Conference on Precision Electromagnetic Measurements",

publisher = "University of Groningen, The Zernike Institute for Advanced Materials",

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Rietveld, G, Elferen, HJV, Giesbers, AJM, Veligura, A, Zeitler, U, Novoselov, KS, Wees, BJV, Geim, AK & Maan, JC 2010, Preparation and Characterisation of Exfoliated Graphene for Quantum Resistance Metrology. in 2010 Conference on Precision Electromagnetic Measurements. University of Groningen, The Zernike Institute for Advanced Materials, blz. 627-628, Conference on Precision Electromagnetic Measurements, Daejeon Convention Center, Daejeon, Korea, 13/06/2010.

TY - CHAP

T1 - Preparation and Characterisation of Exfoliated Graphene for Quantum Resistance Metrology

AU - Rietveld, G.

AU - Elferen, H.J. van

AU - Giesbers, A.J.M.

AU - Veligura, A.

AU - Zeitler, U.

AU - Novoselov, K.S.

AU - Wees, B.J. van

AU - Geim, A.K.

AU - Maan, J.C.

N1 - Relation: http://www.rug.nl/zernike/ Rights: University of Groningen, Zernike Institute for Advanced Materials

PY - 2010

Y1 - 2010

N2 - Exfoliated graphene samples have been prepared for use in quantum resistance metrology. Good progress is recently made in achieving contact resistances to graphene of less than 50 Ω. Details are presented on the handling and measurement of graphene samples.

AB - Exfoliated graphene samples have been prepared for use in quantum resistance metrology. Good progress is recently made in achieving contact resistances to graphene of less than 50 Ω. Details are presented on the handling and measurement of graphene samples.

M3 - Chapter

SN - 9781424467952

SP - 627

EP - 628

BT - 2010 Conference on Precision Electromagnetic Measurements

PB - University of Groningen, The Zernike Institute for Advanced Materials

T2 - Conference on Precision Electromagnetic Measurements, Daejeon Convention Center, Daejeon, Korea

Y2 - 13 June 2010 through 18 June 2010

ER -

Preparation and Characterisation of Exfoliated Graphene for Quantum Resistance Metrology

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