Silicon containing resist materials based on chemical amplification

JC van de Grampel*, R Puyenbroek, BAC Rousseeuw, EWJM an der Drift

*Bijbehorende auteur voor dit werk

    OnderzoeksoutputAcademicpeer review

    Samenvatting

    Two classes of siloxane polymers applicable as resist materials are being described. In the first series of materials acid-sensitive substituents as t-butoxycarbonyloxy, or t-butoxy are linked to a polysiloxane backbone. Preparation of these polymers occurs via hydrosilylation of polymethylhydrosiloxane with suitable olefins. The second class concerns graftcopolymers and/or tercopolymers in which acid-sensitive groups are attached to a carbon backbone in combination with grafted polysiloxane chains. These polymers are synthesized by free radical polymerization of olefins and silicon macromers. In microlithographic experiments two-layer resist systems have been irradiated with e-beam or DUV, the top layer being a silicon-containing polymer in combination with a catalytic amount of a photoacid generator. In general a high sensitivity was observed combined with a high oxygen RIE resistance.

    Originele taal-2English
    TitelINORGANIC AND ORGANOMETALLIC POLYMERS II
    RedacteurenP WisianNeilson, HR Allcock, KJ Wynne
    Plaats van productieWASHINGTON
    UitgeverijAMER CHEMICAL SOC
    Pagina's81-91
    Aantal pagina's11
    ISBN van geprinte versie0-8412-3036-6
    StatusPublished - 1994
    EvenementSymposium on Inorganic and Organometallic Polymers II - Advanced Materials and Intermediates, at the 205th National Meeting of the American-Chemical-Society - , Colombia
    Duur: 28-mrt-19932-apr-1993

    Publicatie series

    NaamACS SYMPOSIUM SERIES
    UitgeverijAMER CHEMICAL SOC
    Volume572
    ISSN van geprinte versie0097-6156

    Other

    OtherSymposium on Inorganic and Organometallic Polymers II - Advanced Materials and Intermediates, at the 205th National Meeting of the American-Chemical-Society
    Land/RegioColombia
    Periode28/03/199302/04/1993

    Citeer dit