Solvent-vapor-assisted imprint lithography

Nicoleta E. Voicu; Sabine Ludwigs; Edward J. W. Crossland; Piers Andrew; Ullrich Steiner

doi:10.1002/adma.200601599

Solvent-vapor-assisted imprint lithography

Nicoleta E. Voicu, Sabine Ludwigs^*, Edward J. W. Crossland, Piers Andrew, Ullrich Steiner

^*Bijbehorende auteur voor dit werk

Onderzoeksoutput › Academic › peer review

48 Citaten (Scopus)

Samenvatting

Sub-micrometer features are replicated into high-molecular-weight polymer resists by using solvent-assisted nanoimprint lithography (see figure). By swelling the polymer in a controlled solvent-vapor atmosphere, millibar pressures and ambient temperatures are sufficient to achieve high-fidelity replication.

Originele taal-2	English
Pagina's (van-tot)	757-761
Aantal pagina's	5
Tijdschrift	Advanced materials
Volume	19
Nummer van het tijdschrift	5
DOI's	https://doi.org/10.1002/adma.200601599
Status	Published - 5-mrt.-2007

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title = "Solvent-vapor-assisted imprint lithography",

abstract = "Sub-micrometer features are replicated into high-molecular-weight polymer resists by using solvent-assisted nanoimprint lithography (see figure). By swelling the polymer in a controlled solvent-vapor atmosphere, millibar pressures and ambient temperatures are sufficient to achieve high-fidelity replication.",

keywords = "NANOIMPRINT LITHOGRAPHY, DIFFUSION",

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AU - Voicu, Nicoleta E.

AU - Ludwigs, Sabine

AU - Crossland, Edward J. W.

AU - Andrew, Piers

AU - Steiner, Ullrich

PY - 2007/3/5

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AB - Sub-micrometer features are replicated into high-molecular-weight polymer resists by using solvent-assisted nanoimprint lithography (see figure). By swelling the polymer in a controlled solvent-vapor atmosphere, millibar pressures and ambient temperatures are sufficient to achieve high-fidelity replication.

KW - NANOIMPRINT LITHOGRAPHY

KW - DIFFUSION

U2 - 10.1002/adma.200601599

DO - 10.1002/adma.200601599

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SP - 757

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JO - Advanced materials

JF - Advanced materials

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