Solvent-vapor-assisted imprint lithography

Nicoleta E. Voicu, Sabine Ludwigs*, Edward J. W. Crossland, Piers Andrew, Ullrich Steiner

*Bijbehorende auteur voor dit werk

OnderzoeksoutputAcademicpeer review

48 Citaten (Scopus)


Sub-micrometer features are replicated into high-molecular-weight polymer resists by using solvent-assisted nanoimprint lithography (see figure). By swelling the polymer in a controlled solvent-vapor atmosphere, millibar pressures and ambient temperatures are sufficient to achieve high-fidelity replication.

Originele taal-2English
Pagina's (van-tot)757-761
Aantal pagina's5
TijdschriftAdvanced materials
Nummer van het tijdschrift5
StatusPublished - 5-mrt.-2007

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