Wrinkled-up nanochannel networks: Long-range ordering, scalability, and X-ray investigation

Angelo Malachias, Yongfeng Mei*, Ratna K. Annabattula, Christoph Deneke, Patrick R. Onck, Oliver G. Schmidt

*Bijbehorende auteur voor dit werk

OnderzoeksoutputAcademicpeer review

44 Citaten (Scopus)

Samenvatting

Highly ordered two-dimensional self-organized nanochannel networks as well as free-standing nanomembranes are produced on rigid substrates by means of III-V semiconductor compressively strained layers grown on top of an etchant-sensitive material. The releasing process is controlled by regularly spaced pits obtained from photolithography and a subsequent wet chemical etching. By tuning basic film parameters such as strain and thickness, one obtains periodic arrays of two-dimensional nanochannel networks with symmetries defined by the shape and periodicity of the photolithographic starting pits. Such nanochannel networks with a submicroscale lateral feature size exhibit a surprising flexibility with respect to the crystal lattice symmetry, retaining the original film crystalline quality as confirmed by X-ray grazing-incidence diffraction (GID) measurements. Finite element modeling helps in understanding the particular process of the cross-nanochannel formation.

Originele taal-2English
Pagina's (van-tot)1715-1721
Aantal pagina's7
TijdschriftAcs Nano
Volume2
Nummer van het tijdschrift8
DOI's
StatusPublished - aug-2008

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