X-ray-reflectivity study of the growth kinetics of vapor-deposited silver films

C. Thompson, G. Palasantzas, Y.P. Feng, J. Krim

OnderzoeksoutputAcademic

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Samenvatting

X-ray-reflectivity measurements have been carried out on silver films which were vapor deposited onto silicon substrates, to investigate the thickness evolution of the film’s surface roughness. The growth exponent was found to be β=0.26±0.05, and the roughness exponenet was found to be H=0.70±0.10.
Originele taal-2English
Aantal pagina's7
TijdschriftPhysical Review B
Volume49
Nummer van het tijdschrift7
DOI's
StatusPublished - 1994

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