X-ray-reflectivity study of the growth kinetics of vapor-deposited silver films

C. Thompson, G. Palasantzas, Y.P. Feng, J. Krim


117 Citaten (Scopus)
294 Downloads (Pure)


X-ray-reflectivity measurements have been carried out on silver films which were vapor deposited onto silicon substrates, to investigate the thickness evolution of the film’s surface roughness. The growth exponent was found to be β=0.26±0.05, and the roughness exponenet was found to be H=0.70±0.10.
Originele taal-2English
Aantal pagina's7
TijdschriftPhysical Review B
Nummer van het tijdschrift7
StatusPublished - 1994

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